EP2666057

CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND

  • :
    EP einkaleyfi: Þýðing ekki lögð inn
  • :
    22.12.2011
  • :
    28.7.2021
  • :
    11856421.0
  • :
    21.12.2031
  • :
    CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND

22.12.2011
28.7.2021
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    FUJIFILM Corporation
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    26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620, JP
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    TSUCHIMURA, Tomotaka
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    Haibara-gun, Shizuoka, JP
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    YATSUO, Tadateru
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    Haibara-gun, Shizuoka, JP
  • :
    2011008331
  • :
    18.1.2011
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    JP
  • :
    201161504431 P
  • :
    5.7.2011
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    US
  • :
    2011255302
  • :
    22.11.2011
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    JP
  • :
    JP2011080549
  • :
    22.12.2011
  • :
    G03F 7/038, C08F 12/24, G03F 7/039