EP2666057
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
Status:
EP einkaleyfi: Þýðing ekki lögð innEP appl. date:
22.12.2011EP published:
28.7.2021EP application number:
11856421.0
EPO information:
European Patent Register
Max expiry date:
21.12.2031
Title:
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
Timeline
Today
22.12.2011EP application
28.7.2021EP Publication
Owner
Name:
FUJIFILM CorporationAddress:
26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620, JP
Inventor
Name:
TSUCHIMURA, TomotakaAddress:
Haibara-gun, Shizuoka, JP
Name:
YATSUO, TadateruAddress:
Haibara-gun, Shizuoka, JP
Priority
Number:
2011008331Date:
18.1.2011Country:
JP
Number:
201161504431 PDate:
5.7.2011Country:
US
Number:
2011255302Date:
22.11.2011Country:
JP
Classification
Categories:
G03F 7/038, C08F 12/24, G03F 7/039