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EP2681623

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM

  • Status:
    EP einkaleyfi: Þýðing ekki lögð inn
  • EP appl. date:
    24.2.2012
  • EP published:
    10.7.2019
  • EP application number:
    12752967.5
  • Max expiry date:
    23.2.2032
  • Title:
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM

Timeline

Today
24.2.2012EP application
10.7.2019EP Publication

Owner

  • Name:
    FUJIFILM Corporation
  • Address:
    26-30, Nishiazabu 2-chome Minato-ku, 106-0031, Tokyo, JP

Inventor

  • Name:
    TAKAHASHI, Hidenori
  • Address:
    Shizuoka, JP
  • Name:
    YAMAGUCHI, Shuhei
  • Address:
    Shizuoka, JP
  • Name:
    KATAOKA, Shohei
  • Address:
    Shizuoka, JP
  • Name:
    SHIRAKAWA, Michihiro
  • Address:
    Shizuoka, JP
  • Name:
    YOSHINO, Fumihiro
  • Address:
    Shizuoka, JP
  • Name:
    SAITOH, Shoichi
  • Address:
    Shizuoka, JP

Priority

  • Number:
    2011043321
  • Date:
    28.2.2011
  • Country:
    JP
  • Number:
    201161447258 P
  • Date:
    28.2.2011
  • Country:
    US
  • Number:
    2011177257
  • Date:
    12.8.2011
  • Country:
    JP
  • Number:
    2012035633
  • Date:
    21.2.2012
  • Country:
    JP

Classification

  • Categories:
    G03F 7/038, G03F 7/004, G03F 7/039, G03F 7/32, G03F 7/11, G03F 7/20, G03F 7/40

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