EP3394674
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM
Status:
EP einkaleyfi: Þýðing ekki lögð innEP appl. date:
20.12.2016EP published:
6.5.2020EP application number:
16815855.8
EPO information:
European Patent Register
Max expiry date:
19.12.2036
Title:
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM
Timeline
Today
20.12.2016EP application
6.5.2020EP Publication
Owner
Name:
Merck Patent GmbHAddress:
Frankfurter Strasse 250, 64293 Darmstadt, DE
Inventor
Name:
CHEN, ChunweiAddress:
Somerville, NJ 08876, US
Name:
LIU, WeihongAddress:
Somerville, NJ 08876, US
Name:
LU, PingHungAddress:
Somerville, NJ 08876, US
Priority
Number:
201514976498Date:
21.12.2015Country:
US
Classification
Categories:
G03F 7/038, G03F 7/004, G03F 7/36, G03F 7/38, G03F 7/40