EP3511774
NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT
:
EP einkaleyfi: Þýðing ekki lögð inn:
20.12.2016:
27.10.2021:
19158497.8
:
19.12.2036
:
NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT
20.12.2016
27.10.2021
:
Merck Patent GmbH:
Frankfurter Strasse 250, 64293 Darmstadt, DE
:
Chen, Chunwei:
Branchburg, NJ 08876, US
:
Liu, Weihong:
Branchburg, NJ 08876, US
:
Lu, PingHung:
Branchburg, NJ 08876, US
:
201514976498:
21.12.2015:
US
:
G03F 7/038, G03F 7/004, G03F 7/36, G03F 7/38, G03F 7/40, G03F 7/20, G03F 7/027