EP3511774
NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT
Status:
EP einkaleyfi: Þýðing ekki lögð innEP appl. date:
20.12.2016EP published:
27.10.2021EP application number:
19158497.8
EPO information:
European Patent Register
Max expiry date:
19.12.2036
Title:
NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT
Timeline
Today
20.12.2016EP application
27.10.2021EP Publication
Owner
Name:
Merck Patent GmbHAddress:
Frankfurter Strasse 250, 64293 Darmstadt, DE
Inventor
Name:
Chen, ChunweiAddress:
Branchburg, NJ 08876, US
Name:
Liu, WeihongAddress:
Branchburg, NJ 08876, US
Name:
Lu, PingHungAddress:
Branchburg, NJ 08876, US
Priority
Number:
201514976498Date:
21.12.2015Country:
US
Classification
Categories:
G03F 7/038, G03F 7/004, G03F 7/36, G03F 7/38, G03F 7/40, G03F 7/20, G03F 7/027