EP3950744

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

  • :
    EP einkaleyfi: Þýðing ekki lögð inn
  • :
    9.3.2020
  • :
    18.10.2023
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    20784526.4
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    8.3.2040
  • :
    PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

9.3.2020
18.10.2023
  • :
    FUJIFILM Corporation
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    26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620, JP
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    SAKITA, Kyohei
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    Haibara-gun, Shizuoka 421-0396, JP
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    2019067401
  • :
    29.3.2019
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    JP
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    2020030660
  • :
    26.2.2020
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    JP
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    JP2020010050
  • :
    9.3.2020
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    C08F 220/16, C08F 220/22, G03F 7/039, G03F 7/20, C08F 220/18, C08F 220/24, C08F 220/28, G03F 7/004, C08L 33/12