EP3950744
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Status:
EP einkaleyfi: Þýðing ekki lögð innEP appl. date:
9.3.2020EP published:
18.10.2023EP application number:
20784526.4
EPO information:
European Patent Register
Max expiry date:
8.3.2040
Title in English:
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICELanguage of the patent:
English
Timeline
Today
9.3.2020EP application
18.10.2023EP Publication
Owner
Name:
FUJIFILM CorporationAddress:
26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-8620, JP
Inventor
Name:
SAKITA, KyoheiAddress:
Haibara-gun, Shizuoka 421-0396, JP
Priority
Number:
2019067401Date:
29.3.2019Country:
JP
Number:
2020030660Date:
26.2.2020Country:
JP
Classification
Categories:
C08F 220/16, C08F 220/22, G03F 7/039, G03F 7/20, C08F 220/18, C08F 220/24, C08F 220/28, G03F 7/004, C08L 33/12