EP4075488

METHOD FOR MANUFACTURING SEMICONDUCTOR WAFERS HAVING AN EPITAXIAL LAYER DEPOSITED FROM THE GAS PHASE IN A DEPOSITION CHAMBER

  • :
    EP einkaleyfi: Þýðing ekki lögð inn
  • :
    13.4.2021
  • :
    28.2.2024
  • :
    21167990.7
  • :
    12.4.2041
  • :
    METHOD FOR MANUFACTURING SEMICONDUCTOR WAFERS HAVING AN EPITAXIAL LAYER DEPOSITED FROM THE GAS PHASE IN A DEPOSITION CHAMBER

13.4.2021
28.2.2024
  • :
    Siltronic AG
  • :
    Einsteinstraße 172 Tower B / Blue Tower, 81677 München, DE
  • :
    Stettner, Thomas
  • :
    83329 Waging am See, DE
  • :
    H01L 21/68