EP4075488
METHOD FOR MANUFACTURING SEMICONDUCTOR WAFERS HAVING AN EPITAXIAL LAYER DEPOSITED FROM THE GAS PHASE IN A DEPOSITION CHAMBER
Status:
EP einkaleyfi: Þýðing ekki lögð innEP appl. date:
13.4.2021EP published:
28.2.2024EP application number:
21167990.7
EPO information:
European Patent Register
Max expiry date:
12.4.2041
Title in English:
METHOD FOR MANUFACTURING SEMICONDUCTOR WAFERS HAVING AN EPITAXIAL LAYER DEPOSITED FROM THE GAS PHASE IN A DEPOSITION CHAMBERLanguage of the patent:
German
Timeline
Today
13.4.2021EP application
28.2.2024EP Publication
Owner
Name:
Siltronic AGAddress:
Einsteinstraße 172 Tower B / Blue Tower, 81677 München, DE
Inventor
Name:
Stettner, ThomasAddress:
83329 Waging am See, DE
Classification
Categories:
H01L 21/68